Ultra-Low Power Neuromorphic Obstacle Detection Using a Two-Dimensional Materials-Based Subthreshold Transistor

Accurate, timely and selective detection of moving obstacles is crucial for reliable collision avoidance in autonomous robots. The area- and energy-inefficiency of CMOS-based spiking neurons for obstacle detection can be addressed through the reconfigurable, tunable and low-power operation capabilities of emerging two-dimensional (2D) materials-based devices. We present an ultra-low power spiking neuron built using an electrostatically tuned dual-gate transistor with an ultra-thin and generic 2D material channel. The 2D subthreshold transistor (2D-ST) is carefully designed to operate under low-current subthreshold regime. Carrier transport has been modelled via over-the-barrier thermionic and Fowler-Nordheim contact barrier tunnelling currents over a wide range of gate and drain biases. Simulation of a neuron circuit designed using the 2D-ST with 45 nm CMOS technology components shows high energy efficiency of ~3.5 pJ/spike and biomimetic class-I as well as oscillatory spiking. It also demonstrates complex neuronal behaviors such as spike-frequency adaptation and post-inhibitory rebound that are crucial for dynamic visual systems. Lobula giant movement detector (LGMD) is a collision-detecting biological neuron found in locusts. Our neuron circuit can generate LGMD-like spiking behavior and detect obstacles at an energy cost of <100 pJ. Further, it can be reconfigured to distinguish between looming and receding objects with high selectivity.Comment: Main text along with supporting information. 4 figure

Wavelength-Controlled Photocurrent Polarity Switching in BP-MoS2_2 Heterostructure

Layered two-dimensional van der Waals (vdW) semiconductors and their heterostructures have been shown to exhibit positive photoconductance (PPC) in many studies. A few recent reports have demonstrated negative photoconductance (NPC) as well that can enable broadband photodetection besides multi-level optoelectronic logic and memory. Controllable and reversible switching between PPC and NPC is a key requirement for these applications. This report demonstrates visible-to-near infrared wavelength-driven NPC and PPC, along with reversible switching between the two, in an air stable, high mobility, broadband black phosphorus (BP) field effect transistor (FET) covered with a few layer MoS$_2$ flake. The crossover switching wavelength can be tuned by varying the MoS$_2$ bandgap through its flake thickness and the NPC and PPC photoresponsivities can be modulated using electrostatic gating as well as laser power. Recombination-driven NPC and PPC allows for reversible switching at reasonable time scales of a few seconds. Further, gate voltage-dependent negative persistent photoconductance enables synaptic behavior that is well-suited for optosynaptic applications.Comment: Main Manuscript and Supporting Informatio

Electrically Controlled Reversible Strain Modulation in MoS2_2 Field-effect Transistors via an Electro-mechanically Coupled Piezoelectric Thin Film

Strain can efficiently modulate the bandgap and carrier mobilities in two-dimensional (2D) materials. Conventional mechanical strain-application methodologies that rely on flexible, patterned or nano-indented substrates are severely limited by low thermal tolerance, lack of tunability and/or poor scalability. Here, we leverage the converse piezoelectric effect to electrically generate and control strain transfer from a piezoelectric thin film to electro-mechanically coupled ultra-thin 2D MoS$_2$. Electrical bias polarity change across the piezoelectric film tunes the nature of strain transferred to MoS$_2$ from compressive $\sim$0.23% to tensile $\sim$0.14% as verified through peak shifts in Raman and photoluminescence spectroscopies and substantiated by density functional theory calculations. The device architecture, built on a silicon substrate, uniquely integrates an MoS$_2$ field-effect transistor on top of a metal-piezoelectric-metal stack enabling strain modulation of transistor drain current 130$\times$, on/off current ratio 150$\times$, and mobility 1.19$\times$ with high precision, reversibility and resolution. Large, tunable tensile (1056) and compressive (-1498) strain gauge factors, easy electrical strain modulation, high thermal tolerance and substrate compatibility make this technique promising for integration with silicon-based CMOS and micro-electro-mechanical systems.Comment: Manuscript and Supplementary Informatio

Near-direct bandgap WSe2WSe_2/ReS2ReS_2 type-II pn heterojunction for enhanced ultrafast photodetection and high-performance photovoltaics

PN heterojunctions comprising layered van der Waals (vdW) semiconductors have been used to demonstrate current rectifiers, photodetectors, and photovoltaic devices. However, a direct or near-direct bandgap at the heterointerface that can significantly enhance optical generation, for high light absorbing few/multi-layer vdW materials, has not yet been shown. In this work, for the first time, few-layer group-6 transition metal dichalcogenide (TMD) $WSe_2$ is shown to form a sizeable (0.7 eV) near-direct bandgap with type-II band alignment at its interface with the group-7 TMD $ReS_2$ through density functional theory calculations. Further, the type-II alignment and photogeneration across the interlayer bandgap have been experimentally confirmed through micro-photoluminescence and IR photodetection measurements, respectively. High optical absorption in few-layer flakes, large conduction and valence band offsets for efficient electron-hole separation and stacking of light facing, direct bandgap $ReS_2$ on top of gate tunable $WSe_2$ are shown to result in excellent and tunable photodetection as well as photovoltaic performance through flake thickness dependent optoelectronic measurements. Few-layer flakes demonstrate ultrafast response time (5 $\mu$s) at high responsivity (3 A/W) and large photocurrent generation and responsivity enhancement at the heterostructure overlap region (10-100X) for 532 nm laser illumination. Large open-circuit voltage of 0.64 V and short-circuit current of 2.6 $\mu$A enables high output electrical power. Finally, long term air-stability and a facile single contact metal fabrication process makes the multi-functional few-layer $WSe_2$/$ReS_2$ heterostructure diode technologically promising for next-generation optoelectronic applications.Comment: Manuscript- 27 pages, 8 figures. Supporting Information- 17 pages, 17 figure